Comparison of three types of redox active polymer for two photon stereolithography
نویسندگان
چکیده
Three-dimensional printingand stereolithographyof functionalmaterials fornanofabricationhave recentlygenerated a big amount of interest, as have responsivematerials. We have investigated the applicability of the redox-responsive polymer poly(ferrocenylsilane) (PFS) for stereolithography purposes. Three types of PFS were synthesized, each functionalized with specific properties to make them interesting for use in nanofabrication. These properties include various stiffness, crosslink densities and hydrophobicities. One of the three PFSs is polycationic, therefore resulting inahydrogel structure.Weshowstructures fabricated fromthesematerials. Commonchallenges inusingnewmaterials such as these for two-photon stereolithography are discussed. © 2017 The Authors Polymers for Advanced Technologies Published by John Wiley & Sons Ltd
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